Giant magnetoelectric effect in Ni-lead zirconium titanate cylindrical structure

Applied Physics Letters

Volumn 92, Issue 5, 2008, Pages

  Pan, D A ^a   Bai, Y ^a   Volinsky, Alex A ^b   Chu, W Y ^a   Qiao, L J ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b University of South Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; MAGNETOELECTRIC EFFECTS; NICKEL COMPOUNDS;

GIANT MAGNETOELECTRIC EFFECT; MAGNETOELECTRIC (ME) COUPLING;

COMPOSITE MATERIALS;

EID: 38949121902     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2841709     Document Type: Article

References (27)

1. H. Schmid, Ferroelectrics FEROA8 0015-0193 161, 1 (1994).
2. N. Hur, S. Park, P. A. Sharma, S. Guha, and S.-W. Cheong, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.93.107207 93, 107207 (2004).
3. T. Lottermoser and M. Fiebig, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.70.220407 70, 220407 (R) (2004).
4. J. Wang, J. B. Neaton, and H. Zheng, Science SCIEAS 0036-8075 10.1126/science.1080615 299, 1719 (2003).
5. S. X. Dong, J. R. Cheng, J. F. Li, and D. Viehland, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1631756 83, 4812 (2003).
6. S. X. Dong, J. F. Li, and D. Viehland, IEEE Trans. Ultrason. Ferroelectr. Freq. Control ITUCER 0885-3010 10.1109/TUFFC.2003.1197958 50, 1236 (2003).
7. G. Srinivasan, E. T. Rasmussen, B. J. Levin, and R. Hayes, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.65.134402 65, 134402 (2002).
8. S. X. Dong, J. F. Li, and D. Viehland, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1644027 95, 2625 (2004).
9. J. van Suchtelen, Philips Res. Rep. PRREA9 0031-7918 27, 28 (1972).
10. C. W. Nan, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.50.6082 50, 6082 (1994).
11. V. M. Laletin, N. Paddubnaya, G. Srinivasan, C. P. De Vreugd, M. I. Bichurin, V. M. Petrov, and D. A. Filippov, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2137450 87, 222507 (2005).
12. J. G. Wan, X. W. Wang, Y. J. Wu, and J. M. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1889237 86, 122501 (2005).
13. J. Ryu, A. V. Carazo, K. Uchino, and H. E. Kim, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.40.4948 40, 4948 (2001).
14. J. Ryu, S. Priya, A. V. Carazo, and K. Uchino, J. Am. Ceram. Soc. JACTAW 0002-7820 10.1111/j.1151-2916.2001.tb00766.x 84, 2905 (2001).
15. K. Mori and M. Wuttig, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1491006 81, 100 (2002).
16. C. W. Nan, L. Liu, N. Cai, J. Zhai, Y. Ye, and Y. H. Lin, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1521247 81, 3831 (2002).
17. C. W. Nan, G. Liu, and Y. H. Lin, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1630157 83, 4366 (2003).
18. J. G. Wan, Z. Y. Li, M. Zeng, H. H. Wang, and J. M. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1935040 86, 202504 (2005).
19. G. Srinivasan and C. P. De Vreugd, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.71.184423 71, 184423 (2005).
20. S. X. Dong, J. Y. Zhai, F. M. Bai, J. F. Li, and D. Viehland, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2007868 87, 062502 (2005).
21. S. X. Dong, J. Y. Zhai, N. G. Wang, F. M. Bai, J. F. Li, and D. Viehland, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2137455 87, 222504 (2005).
22. S. X. Dong, J. Y. Zhai, F. M. Bai, J. F. Li, and D. Viehland, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1899247 97, 103902 (2005).
23. J. Y. Zhai, S. X. Dong, Z. P. Xing, J. F. Li, and D. Viehland, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2337996 89, 083507 (2006).
24. C. W. Chen, Magnetism and Metallurgy of Soft Magnetic Materials (North-Holland, Amsterdam, 1977).
25. C. M. Van der Burgt, Philips Res. Rep. PRREA9 0031-7918 8, 91 (1953).
26. S. Ishio and M. Takahashi, J. Magn. Magn. Mater. JMMMDC 0304-8853 10.1016/0304-8853(85)90062-9 50, 271 (1985).
27. J. E. Lenz, Proc. IEEE IEEPAD 0018-9219 10.1109/5.56910 78, 973 (1990).