Characterization of an ultrashallow junction structure using angle resolved x-ray photoelectron spectroscopy and medium energy ion scattering

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages 298-304

  Saheli, G ^a   Conti, G ^a   Uritsky, Y ^a   Foad, M A ^a   Brundle, C R ^b   MacK, P ^c   Kouzminov, D ^d   Werner, M ^e   Van Den Berg, J A ^e  

^a APPLIED MATERIALS INC   (United States)

^b CR Brundle and Associates   (United States)

^c Thermo Inc   (United Kingdom)

^d CHARLES EVANS AND ASSOCIATES   (United States)

^e UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY (AR-XPS); CHEMICAL BONDING; STATE DEPTH INFORMATION; ULTRASHALLOW JUNCTIONS;

COMPUTER SIMULATION; ION IMPLANTATION; MOSFET DEVICES; SECONDARY ION MASS SPECTROMETRY; SHEET RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTOR JUNCTIONS;

EID: 38849194824     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2834689     Document Type: Article

References (16)

1. http://www/eaglabs.com/files/appnotes/AN438.pdf
2. P. Eyben, M. Xu, N. Duhayon, T. Claysse, and S. Callewaert, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1426368 20, 1 (2002).
3. P. Eyben, D. Vanhaerenm, T. Janssens, T. Hantschel, W. Vandervorst, K. Adachi, and K. Ishimaru, Microelectron. Eng. MIENEF 0167-9317 84, 437 (2007).
4. H. Graoui, G. Conti, M. Hilkene, B. McComb, A. Tjandra, M. A. Foad, D. Kouzminov, J. Hunter, C. J. Hitzman, and C. A. Evans, Nucl. Instrum. Methods Phys. Res. B NIMBEU 0168-583X 237, 336 (2004).
5. A. R. Ghatak, L. Vasudevan, and M. A. Foad, EMRS (European Materials Research Society, 2005).
6. D. Kouzminov (private communication).
7. Thermo Scientific Inc. (part of Thermo Fisher Scientific), 81 Wyman Street, Waltham, MA 02454, USA (Website: http://www.thermo.com/).
8. D. Briggs and J. T. Grant, Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy (IM, Chichester, 2003).
9. S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal. SIANDQ 0142-2421 10.1002/sia.740111107 11, 577 (1988).
10. S. Tanuma, C. J. Powell, and D. R. Penn, J. Electron Spectrosc. Relat. Phenom. JESRAW 0368-2048 10.1016/0368-2048(90)85024-4 52, 285 (1990).
11. A. Jablonski and C. J. Powell, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.1538370 21, 274 (2003).
12. C. J. Powell and A. Jablonski, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.1397463 19, 2604 (2001).
13. J. Watts and J. Wolstenholme, An Introduction to Surface Analysis by XPS and AES (Wiley, Chichester, 2003).
14. J. A. van den Berg, J. Vac. Sci. Technol. B JVTBD9 1071-1023 20, 3 (2002).
15. J. A. van den Berg, Proceedings of the International Conference on Ion Implantation Technology (ITT 2002) (IEEE Operations Center, Piscataway, NJ, 2003), pp 597-600.
16. D. Giubertoni, M. Bersani, M. Barozzi, S. Pederzoli, E. Iacob, J. A. van den Berg, and M. Werner, Appl. Surf. Sci. ASUSEE 0169-4332 10.1016/j.apsusc. 2006.02.137 252, 7214 (2006).