The effect of deposition parameters on the properties of SrCu2O2 films fabricated by pulsed laser deposition

Thin Solid Films

Volumn 516, Issue 7, 2008, Pages 1449-1452

  Papadopoulou, E L ^a,b   Viskadourakis, Z A ^a,b   Pennos, A V ^b   Huyberechts, G ^c   Aperathitis, E ^a  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

^c UMICORE   (Belgium)

Author keywords

Depositon process; Laser ablation; Strontium

Indexed keywords

CARRIER CONCENTRATION; PARTIAL PRESSURE; PULSED LASER DEPOSITION; STRONTIUM COMPOUNDS; TRANSPARENCY;

CRYSTALLINITY; DEPOSITION PARAMETERS; OXYGEN PARTIAL PRESSURES; SUBSTRATE TEMPERATURES;

THIN FILMS;

EID: 38649138369     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.085     Document Type: Article

References (10)

1. Chopra K.L., et al. Thin Solid Films 102 (1983) 1
2. Ginley D.S., et al. MRS Bull. 25 8 (2000) 15 (and references therein)
3. Kawazoe H., et al. Nature 389 (1997) 939
4. Kudo A., et al. Appl. Phys. Lett. 73 (1998) 220
5. Teske L., et al. Z. Anorg. Chem. 379 (1970) 939
6. Varadarajan V., et al. TSF 488 (2005) 173
7. Bobeico E., et al. TSF 444 (2003) 70
8. Ginley D., et al. TSF 445 (2003) 193
9. Nie X., et al. PRB 65 (2002) 075111
10. Ohta H., et al. J. Appl. Phys. 91 (2002) 374