Growth and characterisation of CaCu2Ox thin films by pulsed injection MOCVD

Thin Solid Films

Volumn 516, Issue 7, 2008, Pages 1461-1463

  Deschanvres, J L ^a   Jimenez, C ^a   Rapenne, L ^a   McSporran, N ^a   Servet, B ^b   Durand, O ^b   Modreanu, M ^c  

^a LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

^b THALES RESEARCH AND TECHNOLOGY   (France)

^c UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

CVD; Thin film; Transparent conducting oxide

Indexed keywords

ANNEALING; COPPER; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PARTIAL PRESSURE;

CATIONIC COMPOSITION; COPPER-CALCIUM RATIO; TRANSMITTANCE;

THIN FILMS;

EID: 38649122123     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.089     Document Type: Article

References (9)

1. Ju H., Hwang S., Jeong C.-O., Park S.-H., Choi J.-G., and Park C. Appl. Phys. A 79 (2004) 9
2. Ginley D.S., and Bright C. MRS Bull. (August 2000) 15
3. Gordon R.G. MRS Bull. (August 2000) 52
4. Banerjee A.N., and Chattopadhyay K.K. Prog. Cryst. Growth Charact. Mater. 50 (2005) 52
5. Kawazoe H., Yasukawa M., Hyodo H., Kurita M., Yanagi H., and Hosono H. Nature 389 (1997) 939
6. Nie X., Wei S.-H., and Zhang S.B. Phys. Rev. B 65 (2002) 75111
7. Senateur J.P., et al. J. Alloys Compd. 251 (1997) 288
8. Suzuki R.O., Bohac P., and Gauckler L.J. J. Am. Ceram. Soc. 77-1 (1994) 41
9. Condorelli G.G., Malandrino G., and Fragala I. Chem. Mater. 6 (1994) 1861