Critical thickness threshold in HfO2 layers

Solid State Phenomena

Volumn 134, Issue , 2008, Pages 67-70

  Besson, Pascal ^a   Loup, Virginie ^b   Salvetat, Thierry ^b   Rochat, Névine ^b   Lhostis, Sandrine ^a   Favier, Sylvie ^a   Dabertrand, Karen ^a   Cosnier, Vincent ^a  

^a STMICROELECTRONICS   (France)

^b CEA GRENOBLE   (France)

Author keywords

Crystallized; High k; Thickness; Threshold

Indexed keywords

EID: 38549166288     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (5)

1. Karen Dabertrand, et al, EMRS-2006, Symposium
2. Shinji Fujii, et al, Applied Physics Letters 86 (2005)
3. F.Tardif, et al, UCPSS, Belgium (1996), p 175.
4. S. Petitdidier, et al, UCPSS, (2002)
5. N.Rochat, et al, Physica Status Solidi (c), 1 (2003)