Study of a metal gate and silicon selective “dry ash only” process for combined extension and halo implanted photo resist

Solid State Phenomena

Volumn 134, Issue , 2008, Pages 113-116

  Mannaert, G ^a   Baklanov, M R ^a   Goossens, D ^a   Vertommen, J ^b   Boullart, W ^a  

^a IMEC   (Belgium)

^b LAM RESEARCH CORPORATION   (Belgium)

Author keywords

Crust layer; Extension implant; Metal gate; Resist strip

Indexed keywords

EID: 38549109555     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.134.113     Document Type: Conference Paper

References (1)

1. A. Kirkpatrick, N. Fernandes and T. Uk, Gasonics International and G. Patrizi, Philips Semiconductor Micro magazine, July/August 1998 (See e. g.: http://www. micromagazine. com).