Preparation of silver nanoparticles having low melting temperature through a new synthetic process without solvent

Journal of Nanoscience and Nanotechnology

Volumn 7, Issue 11, 2007, Pages 3805-3809

  Kim, Nam Hee ^a   Kim, Ju Young ^a   Ihn, Kyo Jin ^a  

^a Kangwon National University   (South Korea)

Author keywords

Differential scanning calorimetry; Melting temperature; Polyoxyethylene maleate based surfactant (PEOM); Silver nanoparticles

Indexed keywords

CONVENTIONAL PROCESSING; LOW MELTING; MALEATE; POLY(OXYETHYLENE); SILVER NANOPARTICLES (NPS); SILVER SALTS; SYNTHETIC METHODS; SYNTHETIC PROCESS;

FLUIDS; MELTING POINT; NANOPARTICLES; NANOSTRUCTURES; SALTS; SILVER; SOLVENTS; SURFACE ACTIVE AGENTS;

PRECIOUS METALS;

NANOMATERIAL; SILVER; SOLVENT;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; TEMPERATURE; TRANSITION TEMPERATURE; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SILVER; SOLVENTS; SURFACE PROPERTIES; TEMPERATURE; TRANSITION TEMPERATURE;

EID: 38449090046     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2007.044     Document Type: Conference Paper

References (18)

1. Y. K. Jeong, Y. J. Shin, and H. Back J. Korean Acad. Dent. Health 22, 347 (1998).
2. H. Xie, H. Lee, W. Youn, and M. Choi, J. Appl. Phys. 94, 4697 (2003).
3. D. Bethell, M. Brust, J. Schiffrin, and C. Kiely, J. Electroanal. Chem. 409, 137 (2000).
4. N. Shirtcliffe, U. Nickel, and S. Schneider, J. Colloid and Interface Sci. 211, 122(1999).
5. A. David, P. Tanaka, A. Margot, L. Tanco, and S. Niwa, J. Membrane Sci. 247, 21 (2005).
6. D. Wu and Y. Fang, Spectrochimica Acta Part A 60, 1845 (2004).
7. P. K. Khanna, N. Singh, S. Charan, and A. K. Viswanath, Mat. Chem. Phy. 92, 214 (2005).
8. D. Chem and L. Gao, J. Cryst. Growth 264, 216 (2004).
9. I. S. Elena, V. K. Vera, V. K. Victor, and A. B. Philippe, J. Cryst. Growth 275, 2351 (2005).
10. P. Buffat and J.-P. Borel, Phys. Rev. A 13, 2287 (1976).
11. F. Ercolessi, W. Andreoni, and E. Tosatti, Phys. Rev. Lett. 66, 911 (1991).
12. K. F. Peters, J. B. Cohen, and Y. W. Chung, Phys. Rev. B 57, 13430 (1998).
13. A. Stella, P. Cheyssac, and R. Kofman, Science and Technology of Thin Films, World Scientific, Singapore (1996), p. 57.
14. H. P. Klug and L. E. Alexander, X-Ray Diffraction Procedures, Wiley (Interscience), New York (1974), 2nd edn., p. 656.
15. K. F. Peters, Y. W. Chung, and J. B. Cohen, Appl. Phys. Lett. 71, 2391 (1997).
16. J. F. Lutsko, D. Wolf, S. R. Phillpot, and S. Yip, Phys. Rev. B 40, 2841 (1989).
17. K. K. Nanda, S. N. Sahu, and S. N. Behera, Phys. Rev. A 66, 013208 (2002).
18. W. H. Qi, M. P. Wang, M. Zhou, X. O. Shen, and X. F. Zhang, J. Phys. and Chem. of Solid 67, 851 (2006).