Compensation for imaging errors in EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 833-838

  Harris, Paul ^a   McCallum, Martin ^a  

^a Nikon Precision Europe GmbH   (United Kingdom)

Author keywords

EUV lithography; Mask Error Factor; Shadowing; Simulation

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE REFLECTION; ERROR COMPENSATION; FOURIER OPTICS; IMAGING TECHNIQUES; MIRRORS; ULTRAVIOLET RADIATION;

ELECTROMAGNETIC SPECTRUM; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; MASK ERROR FACTOR (MEF); SHADOWING;

PHOTOLITHOGRAPHY;

EID: 3843151428     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533725     Document Type: Conference Paper

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