High-performance profiles and characteristics of chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 953-959

  Mochizuki, Hideaki ^a   Tomiyasu, Hiroshi ^a   Kameyama, Yasuhiro ^a   Tsukamoto, Michinori ^a   Niinomi, Takaaki ^a   Tanaka, Yuki ^a   Fujita, Jun ^a   Ochiai, Tameichi ^a  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

CD control; DUV lithography; Excimer laser; Isolated line; Simulation

Indexed keywords

ACIDS; DATA STORAGE EQUIPMENT; DIFFUSION; EXCIMER LASERS; FUNCTIONAL GROUPS; FUNCTIONAL POLYMERS; GAS LASERS; GEOMETRICAL OPTICS; HYDROGEN; HYDROGEN BONDS; KRYPTON; LIGHT; MICROMETERS; PHOTORESISTORS; PHOTORESISTS; THICKNESS MEASUREMENT;

ACID DIFFUSION LENGTHS; ACID DIFFUSIONS; BAKING TEMPERATURES; BASE POLYMERS; CD CONTROL; CHEMICALLY AMPLIFIED RESISTS; DUV LITHOGRAPHY; HYDROXYL GROUPS; ILLUMINATION OPTICS; ISOLATED LINE; KRF EXCIMER LASERS; LIGHT INTENSITIES; LINE-WIDTH CONTROLS; OPTICAL IMAGES; OPTICAL PARAMETERS; PATTERN PROFILES; PERFORMANCE PROFILES; POST EXPOSURES; SIMULATION;

DISSOLUTION;

EID: 3843143202     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312352     Document Type: Conference Paper

References (4)

1. For example, H.Shiraishi, N.Hayashi, T.Ueno, T.Sakamizu, and F.Murai, J. Vac. Sci. Technol., B9, 3343(1991);
2. F.Houlihan, F.Bouchard, J.M.J.Frechet and C.G.Willson, Can. J. Chem., 63, 153(1985);
3. J.Fahey, W.Conley, B.Brunsvold, D.Yang, W.Moreau, G.Jordhamo, S.Pratt, D.Crickatt, G.Hefferon and R.Wood, Proc. SPIE 2438, 125(1995);
4. T.Yamaoka, N.Nishiki, K.Koseki and M.Koshiba, Polym.Eng. Sci., 29, 856(1989)