Wet-recess process optimization of a bottom antireflective coating for the via first dual damascene scheme

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 633-639

  Brakensiek, Nickolas L ^a   Kidd, Brian ^b   Washburn, Carlton ^a   Murphy, Earnie ^a  

^a BREWER SCIENCE INC   (United States)

^b Integrated Designs Inc   (United States)

Author keywords

BARC; Bottom anti reflective coating; Dual damascene; DUV; Gap fill; Photolithography; Via fill; Via first

Indexed keywords

BOTTOM ANTI-REFLECTIVE COATING (BARC); DUAL DAMASCENE; DUV; GAP-ILL; VIA FILL; VIA-FIRST;

BYPRODUCTS; CROSSLINKING; DIAPHRAGMS; DISPENSERS; LIGHT REFLECTION; MATRIX ALGEBRA; OPTIMIZATION; PARAMETER ESTIMATION; PHOTOLITHOGRAPHY;

ANTIREFLECTION COATINGS;

EID: 3843130632     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533817     Document Type: Conference Paper

References (1)

1. Brakensiek, Nickolas, et. al. "Novel BARC Etchback Method for Via First Dual Damascene Process." Interface 2003