Novel reactions of quadricyclane - A new route to monomers for low-absorbing polymers in 157 nm photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 266-275

  Marsella, John A ^a   Abdourazak, Atteye H ^a   Carr, Richard V C ^a   Markley, Thomas J ^a   Robertson III, Eric A ^a  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

Fluoropolymer; Norbornene; Photoresist; Quadricyclane

Indexed keywords

NORBORNENE; QUADRICYCLANE; VICINITY;

ABSORPTION; DATA REDUCTION; ETHERS; FLUORINE CONTAINING POLYMERS; MONOMERS; OLEFINS; RESINS;

PHOTORESISTS;

EID: 3843119766     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535613     Document Type: Conference Paper

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