0.85 NA ArF scanner: Advancing features and performances

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 758-767

  Namba, Atsushi ^a   Uzawa, Shigeyuki ^a   Kotoku, Kenichi ^a  

^a CANON INC   (Japan)

Author keywords

Low aberration; Overlay; Step and scan exposure system; Synchronization accuracy; Throughput

Indexed keywords

FOCUSING; INTERFEROMETERS; LIGHTING; OPTICAL SENSORS; OPTICS; SEMICONDUCTOR MATERIALS;

LOW ABERRATION; OVERLAYS; PROJECTION OPTICS; STEP-AND-SCAN EXPOSURE SYSTEMS; SYNCRONIZATION ACCURACY; THROUGHPUTS;

IMAGING TECHNIQUES;

EID: 3843114362     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544239     Document Type: Conference Paper

References (2)

1. International Technology Roadmap for Semiconductors (ITRS), 2003 Edition, http://public.itrs.net/Files/2003ITRS/Home2003.htm
2. Itaru Fujita, Next Generation Scanner for Sub-100nm Lithography, Canon INC., 2003 SPIE Vol. 5040, p. 811-821, Optical Microlithography XV