Evaluation of wet-developable KrF organic BARC to improve CD uniformity for implant application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 461-470

  Guilmeau, Isabelle ^a   Guerrero, Alice F ^c   Blain, Vincent ^c   Kremer, Stéphanie ^d   Vachellerie, Vincent ^b   Lenoble, Damien ^b   Nogueira, Patricia ^b   Mougel, Sébastien ^b   Chapon, Jean Damien ^b  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

^c BREWER SCIENCE INC   (United States)

^d KLA TENCOR CORPORATION   (United States)

Author keywords

Bottom anti reflective coating (BARC); CD uniformity; Implantation; KrF photoresist; Profiles characterization; Wet developable

Indexed keywords

CROSSLINKING; ION IMPLANTATION; OPTICAL RESOLVING POWER; OPTIMIZATION; PHOTORESISTS; SILICON WAFERS; THIN FILMS;

BOTTOM ANTI-REFLECTIVE COATING (BARC); CD UNIFORMITY; KRF PHOTORESISTS; PROFILE CHARACTERIZATION; WET DEVELOPABLE;

ANTIREFLECTION COATINGS;

EID: 3843055629     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538061     Document Type: Conference Paper

References (3)

1. I. Guilmeau, F. Levera, M. Hellion, P.J. Goirand, Proc. Interface'03 (2003), ref 34
2. C.Cox, D. Dippel, C. Ghelli, P. Valerie, B. Simmons, and A. Guerrero, Proc. SPIE (2003), vol. 5039, pp.878-882.
3. M. Powers, R. Khen, C. Ghelli, B. Nettleship, C. Cox, Proc. Interface'02 (2002).