The effect of pressure on growth rate and quality of diamond films prepared by microwave plasma chemical vapor deposition

Wuli Xuebao/Acta Physica Sinica

Volumn 56, Issue 12, 2007, Pages 7183-7187

  Li, Xiao Hong ^a,b   Guo, Wan Tu ^b   Chen, Xue Kang ^b   Wu, Gan ^b   Yang, Jian Ping ^b   Wang, Rui ^b   Cao, Sheng Zhu ^b   Yu, Rong ^b  

^a SOUTHWEST UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Deposition pressure; Diamond films; Growth rate

Indexed keywords

EID: 38049187761     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)