The effect of temperature of substrate and oxygen partial pressure on V2O5 films fabricated by magnetron sputtering

Wuli Xuebao/Acta Physica Sinica

Volumn 56, Issue 12, 2007, Pages 7255-7261

  Zhang, Hui ^a,b   Liu, Ying Shu ^a   Liu, Wen Hai ^a   Wang, Bao Yi ^b   Wei, Long ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b INSTITUTE OF HIGH ENERGY PHYSICS   (China)

Author keywords

Magnetron sputtering; Phase change films; Vanadium oxide; X ray photoelectron spectrum

Indexed keywords

EID: 38049165551     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)