Lattice Boltzmann method for weakly ionized isothermal plasmas

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 76, Issue 6, 2008, Pages

  Li, Huayu ^a   Ki, Hyungson ^a  

^a Michigan State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOLTZMANN EQUATION; DIFFUSION; ELECTRIC FIELD EFFECTS; IONIZATION;

ISOTHERMAL PLASMAS; LATTICE BOLTZMANN METHOD (LBM); NONDIMENSIONAL RELAXATION;

PLASMAS;

EID: 37749053223     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.76.066707     Document Type: Article

References (24)

1. S. Chen and G. D. Doolen, Annu. Rev. Fluid Mech. ARVFA3 0066-4189 10.1146/annurev.fluid.30.1.329 30, 329 (1998).
2. X. Y. He and L. S. Luo, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.55.R6333 55, R6333 (1997).
3. S. Y. Chen, H. D. Chen, D. Martinez, and W. Matthaeus, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.67.3776 67, 3776 (1991).
4. D. O. Martinez, S. Y. Chen, and W. H. Matthaeus, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.870640 1, 1850 (1994).
5. A. I. D. Macnab, G. Vahala, L. Vahala, J. Carter, M. Soe, and W. Dorland, Physica A PHYADX 0378-4371 362, 48 (2006).
6. L. S. Luo and S. S. Girimaji, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.66.035301 66, 035301 (2002).
7. Z. L. Guo and T. S. Zhao, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.71.026701 71, 026701 (2005).
8. A. G. Xu, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.71.066706 71, 066706 (2005).
9. V. Sofonea and R. F. Sekerka, Physica A PHYADX 0378-4371 10.1016/S0378-4371(01)00246-1 299, 494 (2001).
10. P. Asinari, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.73.056705 73, 056705 (2006).
11. V. Sofonea and R. F. Sekerka, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.71.066709 71, 066709 (2005).
12. J. A. Bittencourt, Fundamentals of Plasma Physics (Springer, New York, 2004).
13. S. Succi, The Lattice Boltzmann Equation for Fluid Dynamics and Beyond (Clarendon Press, Oxford/Oxford University Press, New York, 2001).
14. R. W. Hockney and J. W. Eastwood, Computer Simulation using Particles (A. Hilger, Bristol, England/Philadelphia, 1988).
15. R. R. Nourgaliev, T. N. Dinh, T. G. Theofanous, and D. Joseph, Int. J. Multiphase Flow IJMFBP 0301-9322 10.1016/S0301-9322(02)00108-8 29, 117 (2003).
16. X. Y. He, X. W. Shan, and G. D. Doolen, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.57.R13 57, R13 (1998).
17. X. Y. He and L. S. Luo, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.56.6811 56, 6811 (1997).
18. A. K. Gunstensen, D. H. Rothman, S. Zaleski, and G. Zanetti, Phys. Rev. A PLRAAN 1050-2947 10.1103/PhysRevA.43.4320 43, 4320 (1991).
19. D. Grunau, S. Y. Chen, and K. Eggert, Phys. Fluids A PFADEB 0899-8213 10.1063/1.858769 5, 2557 (1993).
20. X. Y. He, L. S. Luo, and M. Dembo, J. Comput. Phys. JCTPAH 0021-9991 10.1006/jcph.1996.0255 129, 357 (1996).
21. Z. L. Guo, C. G. Zheng, and T. S. Zhao, J. Sci. Comput. JSCOEB 0885-7474 10.1023/A:1013280900427 16, 569 (2001).
22. X. Y. He and G. D. Doolen, Phys. Rev. E PLEEE8 1063-651X 10.1103/PhysRevE.56.434 56, 434 (1997).
23. X. Y. He, L. S. Luo, and M. Dembo, Physica A PHYADX 0378-4371 10.1016/S0378-4371(96)00486-4 239, 276 (1997).
24. T. Makabe, Plasma Electronics: Applications in Microelectronic Device Fabrication (CRC Press, Hoboken, 2006).