Substrate-dependent deposition efficiency on mirrors exposed in the TCV divertor

Fusion Engineering and Design

Volumn 83, Issue 1, 2008, Pages 30-38

  De Temmerman, G ^a   Pitts, R A ^b  

^a UNIVERSITY OF BASEL   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

Deposition; First mirrors; ITER; Reflectivity; TCV

Indexed keywords

DEPOSITION; IMPURITIES; INTEGRATED CIRCUIT MANUFACTURE; MIRRORS; RELIABILITY THEORY; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT;

FIRST MIRRORS; METALLIC MIRRORS; OPTICAL DIAGNOSTICS SYSTEMS; REFLECTIVITY CHANGES;

TOKAMAK DEVICES;

EID: 37749034338     PISSN: 09203796     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.fusengdes.2007.04.044     Document Type: Article

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