The power effect in write-in process of Ag-TCNQ electric recording thin film

Physica Status Solidi (A) Applied Research

Volumn 181, Issue 2, 2000, Pages

  Wan, Xinggong ^a   Li, Jin ^a   Chen, Dianyong ^a   Jiang, Yiming ^a   Hua, Zhongyi ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DEPOSITION; ELECTRIC FIELDS; ELECTRIC IMPEDANCE; ELECTRIC POTENTIAL; ELECTRODES; GLASS; MOLECULAR ORIENTATION; OPTICAL RECORDING; THIN FILMS; VACUUM;

ELECTRIC RECORDING THIN FILM; ELECTRIC SWITCHING; IMPEDANCE TRANSITION; POWER CONTROLLED SWITCHING; POWER EFFECT;

SILVER COMPOUNDS;

EID: 37649026055     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200010)181:23.0.CO;2-E     Document Type: Article

References (9)

1. R. S. POTEMBER, T. O. POEHLER, and D. O. COWAN, Appl. Phys. Lett. 34, 405 (1979).
2. R. S. POTEMBER, T. O. POEHLER, and R. C. BENSON, Appl. Phys. Lett. 41, 548 (1982).
3. C. SATO, S. WAKAMATSU, K. TADOKORO, and K. ISHII, J. Appl. Phys. 68, 6535 (1990).
4. J. J. HOAGLAND, X. D. WANG, and K. W. HIPPS, Chem. Mater. 5, 54 (1992).
5. L. SHIELD, J. Amer. Chem. Soc., Faraday Trans. 81, 2 (1985).
6. T. WATARAI and S. DATTA, NEC Tech. J. 52, 31 (1999).
7. C. A. WIALROWSKI and CH. H. HOUSE, Logic Circuits and Microcomputer, McGraw-Hill, Inc., New York 1980.
8. C. JOACHIM and J. P. LAUNAY, J. Mol. Electron. 6, 37 (1990).
9. M. P. SAMASTA, W. TIAN, S. DATTA, J. L. HENDERSON, and C. P. KUBIAK, Phys. Rev. B 53, R7626 (1996).