메뉴 건너뛰기




Volumn 585, Issue 1-2, 2008, Pages 69-75

Rotating dual-wire beam profile monitor optimized for use in merged-beams experiments

Author keywords

Beam profile monitor; Beam scanner; Merged beams; Overlap; Rotating wire

Indexed keywords

ANGLE MEASUREMENT; OPTIMIZATION; SCANNING;

EID: 37549009091     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2007.10.041     Document Type: Article
Times cited : (22)

References (17)
  • 13
    • 37549000741 scopus 로고    scopus 로고
    • C.C. Havener, R. Al-Rejoub, United States Patent 6972551, UT-Batelle, LLC, Oak Ridge, TN.
  • 14
    • 37549008901 scopus 로고    scopus 로고
    • National Electrostatics Corporation, Middleton, WI 53562-0310.
  • 15
    • 37549011551 scopus 로고    scopus 로고
    • National Electrostatics Corporation Instruction Manual for Model BPM80 Beam Profile Monitor.
  • 16
    • 37549013893 scopus 로고    scopus 로고
    • National Electrostatics Corporation current amplifier, Model 2HA003090, provided with the BPM80 Beam Profile Monitor system.
  • 17
    • 37549016159 scopus 로고    scopus 로고
    • {ring operator} relative to the xy coordinate frame, this distance projected onto either the x or y axis is π r / sqrt(2). For the BPM80 scanner, the scanning circle radius r = 2.7 cm, which gives a calibration distance of 6.0 cm between the first and third fiducial positions.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.