Formation of PZT from multilayer-structured PbTiO 3 and PbZrO 3 thin films prepared by plasma-enhanced chemical vapor deposition

Journal of Industrial and Engineering Chemistry

Volumn 10, Issue 3, 2004, Pages 379-383

  Lee, Won Gyu ^a   Woo, Seong Ihl ^b  

^a Kangwon National University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Interdiffusion; Metal organic chemical vapor deposition; Multilayered thin films; PZT

Indexed keywords

AMORPHOUS MULTILAYERS; ANNEALING TIME; APPLIED VOLTAGES; COERCIVE FIELD; MULTILAYERED THIN FILMS; PZT; PZT THIN FILM; REMANANT POLARIZATION; THERMAL ANNEALING PROCESS; UNIFORM DISTRIBUTION;

ANNEALING; DEPOSITION; ELECTRIC PROPERTIES; INDUSTRIAL CHEMICALS; INTERDIFFUSION (SOLIDS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; MULTILAYERS; ORGANIC CHEMICALS; PEROVSKITE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLATINUM; VAPOR DEPOSITION;

FILM PREPARATION;

EID: 37549008073     PISSN: 1226086X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. M. Okuyama, Y. Matsui, H. Hakano, T. Nakagawa, and Y. Hamakana, Jpn. J. Appi Phys., 18, 1663 (1979).
2. D. W. Bondurant, Ferroelectrics, 112, 273 (1990).
3. D. L. Polla and P. Schiller, Integr. Ferroelectr., 7, 359 (1995).
4. B. Jaffe, W. R. Cook, and H. Jaffe, Piezoelectric Ceramics, Academic Press, London (1971).
5. S. P. Murarka, Silicides for VLSI Applications, Academic Press, NY (1982).
6. E. I. Tochitsky and N. I. Romanova, Thin Solid Films, 110, 55 (1983).
7. C. C. Li and S. B. Desu, Ceram. Trans., 25, 59 (1991).
8. C. C. Li and S. B. Desu, Mater. Res. Soc. Symp. Proc., 243, 387 (1992).
9. T. Iijima, G. He, and H. Funakubo, J. Crystal Growth, 236, 248 (2002).
10. W. G. Lee, S. I. Woo, J. C. Kim, S. H. Choi, and K. H. Oh, Appi. Phys. Lett., 63, 2511 (1993).
11. W. G. Lee and S. I. Woo, Integr. Ferroelectr., 5, 107 (1994).
12. H. Tabata, T. Kawai, S. Kaeai, O. Murata, J. Fujoka, and S. Minakata, Appi. Phys. Lett., 59, 2354 (1991).
13. G. Arlt and H. Neumann, Ferroelectrics, 87, 109 (1988).
14. J. F. Scott, C. A. Paz de Araujo, B. M. Melnick, L. D. McMillan, and R. Zuleeg, J. Appi. Phys., 70, 382 (1991).
15. G. J. M. Dormans, M. de Keijer, and P. J. van Veldhoven, Mater. Res. Soc. Symp. Proc., 243, 203 (1992).
16. G. Arlt, D. Hennings, and G. de With, J. Appl. Phys., 58, 1619 (1985).
17. K. W. Seo and S. H. Cho, J. Ind. Eng. Chem., 7, 87 (2001).