Effect of penta- and tetramethyl HALS on the radiation resistance of polypropylene

Journal of Applied Polymer Science

Volumn 69, Issue 13, 1998, Pages 2649-2656

  Wang, Huiliang ^a   Chen, Wenxiu ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Hindered amine light stabilizers (HALS); Polypropylene; Radiation resistance; Irradiation

Indexed keywords

ACRYLIC MONOMERS; COMPOSITION EFFECTS; COPOLYMERS; GAMMA RAYS; MOLECULAR WEIGHT; SYNTHESIS (CHEMICAL);

HINDERED AMINE LIGHT STABILIZERS (HALS); RADIATION RESISTANCE;

POLYPROPYLENES;

EID: 3743135139     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19980926)69:13<2649::AID-APP15>3.0.CO;2-P     Document Type: Article

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