Structural and optical properties of SnO2 films grown on α-Al2O3(0 0 0 1) by MOCVD

Journal of Crystal Growth

Volumn 310, Issue 2, 2008, Pages 295-298

  Feng, Xianjin ^a   Ma, Jin ^a   Yang, Fan ^a   Ji, Feng ^a   Luan, Caina ^a   Ma, Honglei ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

A1. Crystal structure; A1. X ray diffraction; A3. Metalorganic chemical vapor deposition; B2. Semiconduting II VI materials

Indexed keywords

ALUMINA; CRYSTAL STRUCTURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; SEMICONDUCTOR MATERIALS; SINGLE CRYSTALS; STRUCTURAL PROPERTIES; TIN DIOXIDE; X RAY DIFFRACTION;

SEMICONDUTING II-VI MATERIALS; SINGLE CRYSTALLINE STRUCTURE;

THIN FILMS;

EID: 37349116262     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.10.039     Document Type: Article

References (14)

1. Ji Z.G., He Z.J., Song Y.L., Liu K., and Xiang Y. Thin Solid Flims 460 (2004) 324
2. Badaway W.A., and Electroanal J. Chemistry 281 (1990) 85
3. Zheng J.P., and Kwok H.S. Appl. Phys. Lett. 63 (1993) 1
4. Schroder D.K. IEEE Trans. Electron. Dev. 25 (1978) 90
5. He Y.S., Campbell J.C., Murphy R.C., Arendt M.F., and Swinnea J.S. J. Mater. Res. 8 (1993) 3131
6. Watson J. Sens. Actuators 5 (1984) 29
7. Tadeev A.V., Delabouglise G., and Labeau M. Thin Solid Films 337 (1999) 163
8. Proscia J., and Gordon R.G. Thin Solid Flims 214 (1992) 175
9. Stjerna B., Olsson E., and Granqvist C.G. J. Appl. Phys. 76 (1994) 3797
10. Ma J., Wang Y.H., Ji F., Yu X.H., and Ma H.L. Mater. Lett. 59 (2005) 2142
11. Kim H., and Piqué A. Appl. Phys. Lett. 84 (2004) 218
12. Shokr E.Kh., Wakkad M.M., Abd El-Ghanny H.A., and Ali H.M. J. Phys. Chem. Solids 61 (2000) 75
13. Ji Z.G., He Z.J., Song Y.L., Liu K., and Ye Z.Z. J. Crystal Growth 259 (2003) 282
14. Cao L., Wan H., Huo L., and Xi S. J. Colloid Interface Sci. 244 (2001) 97