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Volumn 310, Issue 2, 2008, Pages 477-483
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Fluid dynamic analysis of gas flow in a thermal-CVD system designed for growth of carbon nanotubes
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Author keywords
A1. Computer simulation; A1. Fluid dynamic flow; A1. Growth mechanism; A3. Chemical vapor deposition; B1. Carbon nanotubes
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
CRYSTAL GROWTH;
FLOW OF GASES;
FLUID DYNAMICS;
SUBSTRATES;
CATALYST PRECURSORS;
FLUID DYNAMIC FLOW;
GROWTH MECHANISM;
CARBON NANOTUBES;
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EID: 37349111033
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2007.10.064 Document Type: Article |
Times cited : (28)
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References (29)
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