Efficient adaptive strategy for solving inverse problems

Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)

Volumn 4487 LNCS, Issue , 2007, Pages 342-349

  Paszynski M ^a   Barabasz, B ^a   Schaefer, R ^a  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

Author keywords

Finite element method; hp adaptivity; Inverse problems; Molecular statics

Indexed keywords

FINITE ELEMENT METHOD; GLOBAL OPTIMIZATION; INVERSE PROBLEMS; LITHOGRAPHY; THERMAL EXPANSION;

HP ADAPTIVITY; MOLECULAR STATICS; STEP-AND-FLASH IMPRINT LITHOGRAPHY (SFIL); THERMAL EXPANSION COEFFICIENT (CTE);

PROBLEM SOLVING;

EID: 37249039188     PISSN: 03029743     EISSN: 16113349     Source Type: Book Series    
DOI: 10.1007/978-3-540-72584-8_44     Document Type: Conference Paper

References (6)

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5. Paszyński, M., Romkes, A., Collister, E., Meiring, J., Demkowicz, L., Willson, C. G., On the Modeling of Step-and-Flash Imprint Lithography using Molecular Statics Models. ICES Report 05-38 (2005) 1-26
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