Matrix microstructure deteriorations resulting from diamond incorporation in electroplated metal-diamond composites

Surface and Coatings Technology

Volumn 202, Issue 8, 2008, Pages 1357-1363

  Li, Yundong ^a   Zhao, Anqing ^a   Wang, Baoan ^a   Li, Jianwei ^a   Wu, Fenghua ^a  

^a HENAN AGRICULTURAL UNIVERSITY   (China)

Author keywords

62.20.Qp; 81.05.Ni; 81.05.Uw; 81.15.Pq; Electrodeposition; Magnetization; Matrix deterioration; Metallic inclusion; Microstructure observation; Ni Co diamond composite

Indexed keywords

CURRENT DENSITY; DIAMOND FILMS; ELECTRIC CURRENTS; INCLUSIONS; LORENTZ FORCE; MAGNETIC FIELDS; METALLIC MATRIX COMPOSITES; METALLOGRAPHIC MICROSTRUCTURE;

MATRIX MICROSTRUCTURE DETERIORATION; METALLIC INCLUSION;

COMPOSITE COATINGS;

COMPOSITE COATINGS; CURRENT DENSITY; DIAMOND FILMS; ELECTRIC CURRENTS; INCLUSIONS; LORENTZ FORCE; MAGNETIC FIELDS; METALLIC MATRIX COMPOSITES; METALLOGRAPHIC MICROSTRUCTURE;

EID: 37049002504     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.06.029     Document Type: Article

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