Preparation of a nanosilica-modified negative-type acrylate photoresist

Journal of Applied Polymer Science

Volumn 107, Issue 2, 2008, Pages 1179-1188

  Lin, Dar Jong ^a   Don, Trong Ming ^a   Chen, Chin Chung ^a   Lin, Bing Yi ^a   Lee, Chih Kang ^a   Cheng, Liao Ping ^a  

^a TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Composites; Photoresists; Silicas

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; FREE RADICAL POLYMERIZATION; HYDROLYSIS; POLYMETHYL METHACRYLATES; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SILICA; THERMOGRAVIMETRIC ANALYSIS;

PHOTOINITIATORS; THERMAL DECOMPOSITION TEMPERATURE; THERMAL MECHANICAL ANALYSIS;

PHOTORESISTS;

CONDENSATION; CONDENSATION POLYMER; HYDROLYSIS; MONOMER; MORPHOLOGY; NANOCOMPOSITE; POLYACRYLIC ACID; POLYMERIZATION; POLYMETHYL METHACRYLATE; SILICON DIOXIDE; SYNTHESIS; SYNTHETIC RESIN;

EID: 36949013171     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.27151     Document Type: Article

References (23)

1. Zhang, X.; Yang, J.; Zeng, Z.; Huang, L.; Chen, Y.; Wang, H. Polym Int 2006, 55, 466.
2. Mager, M.; Schmalstieg, L.; Mechtel, M.; Kraus, H. Macromol Mater Eng 2001, 286, 682.
3. Lü, N.; Lü, X.; Jin, X.; Lü, C. Polym Int 2007, 56, 138.
4. Bauer, F.; Flyunt, R.; Czihal, K.; Buchmeiser, M. R.; Langguth, H.; Mehnert, R. Macromol Mater Eng 2006, 291, 493.
5. Wan, T.; Feng, F.; Rong, R.; Wang, Y. C. Polym Int 2006, 55, 883.
6. Chen, Y.; Zhou, S.; Yang, H.; Wu, L. Macromol Mater Eng 2005, 290, 1001.
7. Petrovic, Z. S.; Javni, I.; Waddon, A.; Banhegyi, G. J Appl Polym Sci 2000, 76, 133.
8. Zoppi, R. A.; Neves, S. D.; Nunes, S. P. Polymer 2000, 41, 5461.
9. Zhou, W.; Dong, J. H.; Qiu, K. Y.; Wei, Y. J Polym Sci Part A: Polym Chem 1998, 36, 1607.
10. Matejka, L.; Dukh, O.; Kolarik, J. Polymer 2000, 41, 1449.
11. Bosch, P.; Monte, F. D.; Mateo, J. L.; Levy, D. J Polym Sci Part A: Polym Chem 1996, 34, 3289.
12. Hajji, P.; David, L.; Gerard, J. F.; Pascault, J. P.; Vigier, G. J Polym Sci Part B: Polym Phys 1999, 37, 3172.
13. Pietrasik, J.; Zaborski, M. Polym Int 2005, 54, 1119.
14. Souza, F. L.; Bueno, P. R.; Longo, E.; Leite, E. R. Solid State Ionics 2004, 166, 83.
15. Wouters, M. E. L.; Wolfs, D. P.; van der Linde, M. C.; Hovens, J. H. P.; Tinnemans, A. H. A. Prog Org Coat 2004, 51, 312,
16. Soppera, O.; Croutxe-Barghorn, C.; Carre, C.; Blanc, D. Appl Surf Sci 2002, 186, 91.
17. Yu, Y. Y.; Chen, C. Y.; Chen, W. C. Polymer 2003, 44, 593.
18. Yu, Y. Y.; Chen, W. C. Mater Chem Phys 2003, 82, 388.
19. Hwang, S. T.; Hahn, Y. B.; Nahm, K. S.; Lee, Y. S. Colloids Surf A 2005, 259, 63.
20. Yu, S.; Wong, T. K. S.; Hu, X.; Wei, J. Microelectron Eng 2005, 77, 14.
21. Kim, H. K.; Kim, J. G.; Hong, J. W. Polym Test 2002, 21, 417.
22. Chen, W. C.; Lee, S. J. Polym J 2000, 32, 67.
23. Mansur, C. R. E.; Tavares, M. I. B.; Monteiro, E. E. C. J Appl Polym Sci 2000, 75, 495.