Fabrication and electrochemical characterization of boron-doped diamond interdigitated array disc electrode

Proceedings of the Institution of Mechanical Engineers, Part E: Journal of Process Mechanical Engineering

Volumn 221, Issue 4, 2007, Pages 201-205

  Zhong, D J ^a   Tao, F M ^b   Xu, Y L ^a   Jia, J P ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b CALIFORNIA STATE UNIVERSITY   (United States)

Author keywords

Boron doped diamond electrodes; Disc electrode; Interdigitated array electrode; Microelectrode; Photoetching

Indexed keywords

BORON; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DOPING (ADDITIVES); ELECTROCHEMISTRY; ETCHING; FABRICATION; MICROELECTRODES;

BORON-DOPED DIAMOND ELECTRODE; DISC ELECTRODE; INTERDIGITATED ARRAY ELECTRODE; PHOTOETCHING;

ELECTROCHEMICAL ELECTRODES;

BORON; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; ETCHING; FABRICATION; MICROELECTRODES;

EID: 36849006905     PISSN: 09544089     EISSN: None     Source Type: Journal    
DOI: 10.1243/09544089JPME153     Document Type: Article

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