Laser annealing of silicon implanted with both argon and arsenic

Applied Physics Letters

Volumn 37, Issue 1, 1980, Pages 81-83

  Rimini, E ^a   Chu, W K ^a   Baglin, J E E ^a   Tan, T Y ^a   Hodgson, R T ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

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EID: 36749108228     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.91711     Document Type: Article

References (9)