Applying HWCVD to particle coatings and modeling the deposition mechanism

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 674-677

  Lau, Kenneth K S ^a   Gleason, Karen K ^b  

^a Drexel University   (United States)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Initiated chemical vapor deposition; Particle encapsulation; Polymer coating

Indexed keywords

AGGLOMERATION; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FUNCTIONAL POLYMERS; PROTECTIVE COATINGS; SURFACE CHEMISTRY;

FINE PARTICLES; PARTICLE ENCAPSULATION; POLYMER CHEMISTRIES;

POLYMER FILMS;

EID: 36749031656     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.045     Document Type: Article

References (6)

1. Lau K.K., Pryce Lewis H.G., Limb S.J., Kwan M.C., and Gleason K.K. Thin Solid Films 395 (2001) 288
2. Mao Y., and Gleason K.K. Langmuir 20 (2004) 2484
3. Chan K., and Gleason K.K. Langmuir 21 (2005) 8930
4. Lau K.K.S., and Gleason K.K. Macromolecules 39 (2006) 3688
5. Lau K.K.S., and Gleason K.K. Adv. Mater. 18 (2006) 1972
6. Lau K.K.S., and Gleason K.K. Macromolecules 39 (2006) 3695