Surface processes in CF4/O2 reactive etching of silicon

Applied Physics Letters

Volumn 52, Issue 14, 1988, Pages 1170-1172

  Oehrlein, Gottlieb S ^a   Robey, Steve W ^a   Lindström, J Lennart ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549102976     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.99195     Document Type: Article

References (13)