SCOPUS 정보 검색 플랫폼

Volumn 63, Issue 7, 1988, Pages 2406-2413

Neutral radical deposition from silane discharges

Author keywords

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Indexed keywords

EID: 36549102473 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.341034 Document Type: Article

Times cited : (151)

References (34)

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- Diagnostics of a Glow Discharge used to Produce a-Si:H Films, Final Subcontract Report 15 April 1984 to 14 April 1985 (SERI/STR-211-2760, DE85016847).
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30
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- Since most [formula omitted] is produced by reaction (Rl) following H diffusion over major distances, the correct I(x) for [formula omitted] is more diffuse than initial dissociation I(x) shown in Figs. 1 and 3. {The H diffusion-reaction distance is [formula omitted] from measured [Refs. 25(b), 25(c)] [formula omitted] and aniassumed [formula omitted]} However, this difference has a minor effept on [formula omitted] reactions, since the important parameter in this case is the average distance between the source and substrate, not the exact shape of the source.

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