Atomic chlorine concentration measurements in a plasma etching reactor. I. A comparison of infrared absorption and optical emission actinometry

Journal of Applied Physics

Volumn 62, Issue 3, 1987, Pages 792-798

  Richards, Albert D ^a   Thompson, Brian E ^a   Allen, Kenneth D ^a   Sawin, Herbert H ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

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EID: 36549102312     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.339734     Document Type: Article

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