Diffusion of ion-implanted gold in p-type silicon

Journal of Applied Physics

Volumn 64, Issue 11, 1988, Pages 6291-6295

  Coffa, S ^a   Calcagno, L ^a   Campisano, S U ^a   Calleri, G ^b   Ferla, G ^b  

^a UNIVERSITY OF CATANIA   (Italy)

^b Stradale Primosole ^*  (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549101245     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.342087     Document Type: Article

References (11)