Hollow cathode plasma assisted chemical vapor deposition of diamond

Applied Physics Letters

Volumn 52, Issue 20, 1988, Pages 1658-1660

  Singh, B ^a   Mesker, O R ^a   Levine, A W ^a   Arie, Y ^a  

^a SARNOFF CORPORATION   (United States)

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EID: 36549100309     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.99049     Document Type: Article

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