Fast and slow states at the interface of amorphous silicon and silicon nitride

Applied Physics Letters

Volumn 48, Issue 24, 1986, Pages 1672-1674

  Street, R A ^a   Tsai, C C ^a  

^a PALO ALTO RESEARCH CENTER   (United States)

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EID: 36549099779     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.96851     Document Type: Article

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