Comparative study of self-limiting growth of GaAs using different Ga-alkyl compounds: (CH3)3Ga, C2H5(CH 3)2Ga, and (C2H5)3Ga

Journal of Applied Physics

Volumn 68, Issue 11, 1990, Pages 5660-5664

  Sakuma, Y ^a   Ozeki, M ^a   Ohtsuka, N ^a   Kodama, K ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549099329     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.346980     Document Type: Review

References (12)