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Volumn 59, Issue 11, 1986, Pages 3881-3889

High-field tunneling calculations in metal-oxide-silicon capacitors incorporating the perimeter effect

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[No Author keywords available]

Indexed keywords


EID: 36549098844     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.336730     Document Type: Article
Times cited : (4)

References (24)
  • 17
    • 84952857091 scopus 로고    scopus 로고
    • It is a simple matter to show that, under perfect isotropic etching conditions, the angle formed at the interface in given by [formula omitted] where n is the factor by which the material is overetched.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.