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Volumn 64, Issue 11, 1988, Pages 6515-6522

Theory for the plasma anodization of silicon under constant voltage and constant current conditions

Author keywords

[No Author keywords available]

Indexed keywords


EID: 36549097841     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.342076     Document Type: Article
Times cited : (35)

References (24)
  • 8
    • 84950882499 scopus 로고
    • Ph.D. thesis (University of Liverpool).
    • (1983)
    • Kiermasz, A.1
  • 20
    • 84950920430 scopus 로고    scopus 로고
    • The apparatus is available from RYTRAK Semiconductor, Ltd.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.