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Journal of Applied Physics

Volumn 68, Issue 5, 1990, Pages 2127-2132

Diffusion barrier properties of Ti/TiN investigated by transmission electron microscopy

(3) Mandl M a Hoffmann, H a Kucher P b

a UNIVERSITY OF REGENSBURG (Germany)

b SIEMENS AG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549097149 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.346568 Document Type: Article

Times cited : (76)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.