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Applied Physics Letters

Volumn 55, Issue 21, 1989, Pages 2182-2184

New dual-bath technique for electrodeposition of short repeat length multilayers

(5) Goldman, L M a Ross, C A a Ohashi, W a Wu, D a Spaepen, F a

a HARVARD UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549095021 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.102351 Document Type: Article

Times cited : (27)

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