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Journal of Applied Physics

Volumn 64, Issue 1, 1988, Pages 315-322

Mechanisms of sputtering of Si in a Cl2 environment by ions with energies down to 75 eV

(4) Oostra, D J a Haring, A a Van Ingen, R P a De Vries, A E a

a FOM INSTITUTE AMOLF (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549092617 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.341429 Document Type: Article

Times cited : (57)

References (53)

1
- 0003400638
- (Wiley, New York).
- (1980) Glow Discharge Processes
- Chapman, B.N.¹

2
- 84950795412
- edited by G. E. McGuire (Noyes, Park Ridge, NJ).
- (1985) Semiconductor Materials and Process Technologies
- Dautremont-Smith, W.C.¹ Gottscho, R.A.² Schutz, R.J.³

3
- 0018469799
- (1979) J. Appl. Phys , vol.50 , pp. 3189
- Coburn, J.W.¹ Winters, H.F.²

4
- 0018441483
- (1979) J. Vac. Sci. Technol , vol.16 , pp. 391
- Coburn, J.W.¹ Winters, H.F.²

5
- 0000016547
- (1981) Phys. Rev. B , vol.23 , pp. 823
- Tu, Y.¹ Chuang, T.J.² Winters, K.F.³

6
- 0000307870
- (1981) Surf. Sci , vol.103 , pp. 177
- Gerlach-Meyer, U.¹ Coburn, J.W.² Kay, E.³

7
- 0011749704
- (1982) Appl. Phys. Lett , vol.41 , pp. 174
- Haring, R.A.¹ Haring, A.² Saris, F.W.³ de Vries, A.E.⁴

8
- 0022025679
- (1985) Nucl. Instrum. Methods B , vol.7-8 , pp. 825
- Mizutani, T.¹ Dale, C.J.² Chu, W.K.³ Mayer, T.M.⁴

9
- 0021427430
- (1984) J. Appl. Phys , vol.55 , pp. 3813
- Kolfsehoten, A.W.¹ Haring, R.A.² Haring, A.³ de Vries, A.E.⁴

10
- 0022664286
- (1987) Nucl. Instrum. Methods B , vol.18 , pp. 625
- Zalm, P.C.¹ Kolfsehoten, A.W.² Sanders, F.K.M.³ Vischer, P.⁴

11
- 84953683209
- (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 487
- Sanders, F.H.M.¹ Kolfschoten, A.W.² Dieleman, I.³ Haring, R.A.⁴ Haring, A.⁵ de Vries, A.E.⁶

12
- 0042404834
- (1985) J. Vac. Sci. Technol. B , vol.3 , pp. 1384
- Dieleman, J.¹ Sanders, F.H.M.² Kolfschoten, A.W.³ Zalm, P.C.⁴ de Vries, A.E.⁵ Haring, A.⁶

13
- 84913868517
- (1984) J. Vac. Sci. Technol. A , vol.2 , pp. 492
- Vitkavage, D.J.¹ Ameen, M.S.² Mayer, T.M.³

14
- 0022011904
- (1985) J. Appl. Phys , vol.57 , pp. 1336
- Barish, E.L.¹ Vitkavage, D.J.² Mayer, T.M.³

15
- 0020497860
- (1983) J. Vac. Sci. Technol. B , vol.1 , pp. 37
- Barker, R.A.¹ Mayer, T.M.² Pearson, W.C.³

16
- 0042782289
- (1985) J. Vac. Sci. Technol. B , vol.3 , pp. 485
- McNevin, S.C.¹ Becker, G.E.²

17
- 4243152469
- (1986) J. Vac. Sci. Technol. A , vol.4 , pp. 696
- Gillis, H.P.¹ Gignac, W.J.²

18
- 3142681057
- (1985) Appl. Phys. Lett , vol.46 , pp. 1166
- Oostra, D.J.¹ Haring, A.² de Vries, A.E.³ Sanders, F.H.M.⁴ Miyake, K.⁵

19
- 0022022751
- (1986) Nucl. Instrum. Methods B , vol.13 , pp. 556
- Oostra, D.J.¹ Haring, A.² de Vries, A.E.³ Sanders, F.H.M.⁴ van Veen, G.N.A.⁵

20
- 0000239472
- (1986) J. Vac. Sci. Technol. B , vol.4 , pp. 1278
- Oostra, D.J.¹ Haring, A.² de Vries, A.E.³

21
- 0001153540
- (1987) Appl. Phys. Lett , vol.50 , pp. 1506
- Oostra, D.J.¹ van Ingen, R.P.² de Vries, A.E.³ van Veen, G.N.A.⁴

22
- 0015483966
- (1972) J. Appl. Phys , vol.43 , pp. 4965
- Coburn, J.W.¹ Kay, E.²

23
- 0020089108
- (1982) J. Electrochem. Soc , vol.129 , pp. 393
- Bruce, R.H.¹ Reinberg, A.R.²

24
- 36549100807
- (1985) J. Appl. Phys , vol.57 , pp. 59
- Köhler, K.¹ Coburn, J.W.² Horne, D.E.³ Kay, E.⁴

25
- 36549102085
- (1985) J. Appl. Phys , vol.58 , pp. 3350
- Köhler, K.¹ Horne, D.E.² Coburn, J.W.³

26
- 36549100753
- (1986) J. Appl. Phys , vol.59 , pp. 1890
- Thompson, B.E.¹ Allen, K.D.² Richards, A.D.³ Sawin, H.H.⁴

27
- 3843104602
- edited by J. W. Coburn, R. A. Gottscho, and D. W. Hess (Materials Research Society, Pittsburgh, PA).
- (1986) Proceedings of the Symposium on Plasma Processing at the MRS Meeting, Palo Alto, 1986 , pp. 109-114
- Briaud, P.¹ Turban, G.² Grolleau, B.³

28
- 84950816103
- Proceedings of the Meeting of The Electrochemical Society, San Diego, 1986, Extended abstracts, Vol. 86-2
- Coburn, J.W.¹ Köhler, K.²

29
- 3643090763
- (1969) Phys. Rev , vol.184 , pp. 383
- Sigmund, P.¹

30
- 0003127712
- (1981) Top. Appl. Phys , vol.47 , pp. 9
- Sigmund, P.¹

31
- 0020176105
- (1982) J. Vac. Sci. Technol , vol.21 , pp. 725
- Kaufman, H.R.¹ Cuomo, J.J.² Harper, J.M.E.³

32
- 0019574930
- (1981) Rev. Sci. Instrum , vol.52 , pp. 789
- Comsa, G.¹ David, R.² Schumacher, B.J.³

33
- 0038273716
- (1978) Phys. Rev. B , vol.17 , pp. 2612
- Larsen, P.K.¹ Smith, N.V.² Schlüter, M.³ Farrell, H.H.⁴ Ho, K.M.⁵ Cohen, M.L.⁶

34
- 0014653470
- (1969) Surf. Sci , vol.28 , pp. 398
- Florio, J.V.¹ Robertson, W.D.²

35
- 0011282630
- In a paper on laser-induced etching of Si with chlorine, features could be explained by assuming that [formula omitted] fragments 67% into [formula omitted] Our results do not confirm this. Comparing Figs. 5(c) and 7(a) shows that, under [formula omitted] ion bombardment, there is not a significant contribution of [formula omitted] in the time-of-flight spectrum of SiCl obtained at mass setting [formula omitted] Hence, the fragmentation of [formula omitted] into [formula omitted] is negligible. The same conclusion is obtained for [formula omitted] ion bombardment. An analysis of the time-of-ffight spectrum of [formula omitted] (not shown here) proves that [formula omitted] does not contribute to the time-of-flight spectrum of SiCl at mass setting [formula omitted] (Fig. 8).
- (1986) J. Appl. Phys , vol.60 , pp. 2321

36
- 0022775442
- (1986) Europhys. Lett , vol.2 , pp. 449
- de Jonge, R.¹ Majoor, J.² Benoist, K.³ de Vries, A.E.⁴

37
- 84950906710
- Ph.D. thesis, University of Amsterdam and FOM-Institute for Atomic and Molecular Physics, Amsterdam, The Netherlands, December.
- (1987)
- de Jonge, R.¹

38
- 84996261994
- (1968) Philos. Mag , vol.18 , pp. 377
- Thompson, M.W.¹

39
- 0023403937
- (1987) Nucl. Instrum. Methods B , vol.28 , pp. 205
- Haring, R.A.¹ Roosendaal, H.E.² Zalm, P.C.³

40
- 84950844801
- Ph.D. thesis, Leiden University and FOM Amsterdam, The Netherlands.
- (1984)
- Haring, R.A.¹

41
- 0021479744
- (1984) Nucl. Instrum. Methods B , vol.4 , pp. 356
- Urbassek, M.¹

42
- 0003965863
- 60th ed. (Chemical Rubber, Boca Raton, FL),)
- (1979) Handbook of Chemistry and Physics
- Weast, R.C.¹

43
- 0022244298
- (1985) Vacuum , vol.35 , pp. 561
- Yamamura, Y.¹ Bohdansky, J.²

44
- 0022024289
- (1986) Nucl. Instrum. Methods B , vol.13 , pp. 393
- Yamamura, Y.¹ Mizuno, Y.² Kimura, H.³

45
- 84950820692
- (unpublished).
- Oostra, D.J.¹ van Ingen, R.P.² Haring, A.³ de Vries, A.E.⁴ Saris, F.W.⁵

46
- 49149132626
- (1981) J. Nucl. Mater , vol.103-104 , pp. 1319
- Guinan, M.W.¹ Kinney, J.H.²

47
- 0020151989
- (1983) J. Nucl. Mater , vol.117 , pp. 26
- King, W.E.¹ Benedek, R.²

48
- 0010054252
- (IFI/Plenum, New York), Vol2.
- (1975) Ion Implantation Range and Energy Deposition Distributions
- Winterbon, K.B.¹

49
- 0010676821
- edited by H. Ryssel and H. Glawischnig (Springer, Berlin).
- (1982) Ion Implantation Techniques , pp. 157-176
- Biersack, J.P.¹ Ziegler, J.F.²

50
- 0017376478
- (1977) Radiat. Eff , vol.32 , pp. 135
- Thompson, D.A.¹ Walker, R.S.² Davies, J.A.³

51
- 0020721316
- (1983) Phys. Status Solidi , vol.16 , pp. K31
- Goldsmid, H.J.¹ Kaila, M.M.² Paul, G.L.³

52
- 0001731042
- (1983) Appl. Phys. Lett , vol.43 , pp. 669
- Webber, H.C.¹ Cullis, A.G.² Chew, N.G.³

53
- 0003406742
- 5th ed. (Wiley, New York).
- (1976) Introduction to Solid State Physics
- Kittel, C.¹

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