Enhancement of the plasma density and deposition rate in rf discharges

Applied Physics Letters

Volumn 48, Issue 11, 1986, Pages 695-697

  Overzet, L J ^a   Verdeyen, J T ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549092265     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.96746     Document Type: Article

References (15)