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Volumn 61, Issue 1, 1987, Pages 284-293
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Characteristics of thermal SiO2 films during nitridation
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IBM
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 36549091992
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.338818 Document Type: Article |
Times cited : (64)
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References (40)
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