Effects of oxygen-argon mixing on the electrical and physical properties of ZrTiO4 films sputtered on silicon at low temperature

Journal of Applied Physics

Volumn 78, Issue 12, 1995, Pages 7103-7108

  Chang, De An ^a   Lin, Pang ^a   Tseng, Tseung Yuen ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

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EID: 36449009802     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360418     Document Type: Article

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