Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition

Applied Physics Letters

Volumn 65, Issue 6, 1994, Pages 696-698

  Bousetta, A ^a   Lu, M ^a   Bensaoula, A ^a   Schultz, A ^b  

^a UNIVERSITY OF HOUSTON   (United States)

^b Ionwerks   (United States)

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EID: 36449009256     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.112272     Document Type: Article

References (16)