Oxygen precipitation in Czochralski-grown silicon wafers during hydrogen annealing

Applied Physics Letters

Volumn , Issue , 1995, Pages 49-

  Izunome, Koji ^a   Shirai, Hiroshi ^a   Kashima, Kazuhiko ^a   Yoshikawa, Jun ^a   Hojo, Akimichi ^a  

^a Nissei Bldg   (Japan)

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EID: 36449008757     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116752     Document Type: Article

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