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Applied Physics Letters

Volumn , Issue , 1995, Pages 2229-

Nickel atomic diffusion in amorphous silicon

(2) Kuznetsov, A Yu a Svensson, B G a

a ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449008489 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.113175 Document Type: Article

Times cited : (51)

References (10)

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- (1991) Phys. Rev. B , vol.44 , pp. 3702
- Roorda, S.¹ Sinke, W.C.² Poate, J.M.³ Jackobson, D.C.⁴ Dierker, S.⁵ Dennis, B.S.⁶ Eaglesham, D.J.⁷ Spaepen, F.⁸ Fuoss, P.⁹

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10
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- (unpublished)
- Kuznetsov, A.Y.¹ Svensson, B.G.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.