Simulation of cluster evaporation and transient enhanced diffusion in silicon

Applied Physics Letters

Volumn , Issue , 1995, Pages 2395-

  Rafferty, C S ^a   Gilmer, G H ^a   Jaraiz, M ^a   Eaglesham, D ^a   Gossmann, H J ^a  

^a LUCENT TECHNOLOGIES   (United States)

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EID: 36449008252     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116145     Document Type: Article

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