Rapid thermal chemical vapor deposition of thin silicon oxide films using silane and nitrous oxide

Applied Physics Letters

Volumn 60, Issue 24, 1992, Pages 3063-3065

  Xu, X L ^a   Kuehn, R T ^a   Wortman, J J ^a   Ozturk M C ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

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EID: 36449007942     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.106757     Document Type: Article

References (10)