High quality ultrathin dielectric films grown on silicon in a nitric oxide ambient

Applied Physics Letters

Volumn 64, Issue 26, 1994, Pages 3584-3586

  Yao, Z Q ^a   Harrison, H B ^a   Dimitrijev, S ^a   Sweatman, D ^a   Yeow, Y T ^b  

^a GRIFFITH UNIVERSITY   (Australia)

^b UNIVERSITY OF QUEENSLAND   (Australia)

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EID: 36449007231     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.111205     Document Type: Article

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